標題: Study on degradation of crystallized laterally grown poly-Si TFT under Dynamic Stress
作者: Lu, Hau-Yan
Chung, Wan-Fang
Tseng, Tzu-Yi
Chen, Yu-Cheng
Liu, Po-Tsun
Chang, Ting-Chang
Chi, Sien
光電工程學系
Department of Photonics
公開日期: 2007
摘要: The influence of protrusion grain boundary on the degradation of crystallized laterally grown poly-Si TFT under Dynamic Stress is investigated. The degradation of TFT with protrusion grain boundary is more severe and the different damage of the source/drain junction in the TFT with grain boundary closed to source side.
URI: http://hdl.handle.net/11536/9212
ISBN: 978-957-28522-4-8
期刊: IDMC'07: PROCEEDINGS OF THE INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE 2007
起始頁: 503
結束頁: 504
Appears in Collections:Conferences Paper