Ultralow Switching Energy Ni/GeO(x)/HfON/TaN RRAM

Abstract

Using stacked covalent-bond-dielectric GeO(x) on metal-oxynitrideHfON, the Ni/GeO(x)/HfON/TaN resistive random access memory (RRAM) showed ultralow set power of 0.3 mu W (0.1 mu A at 3 V), reset power of 0.6 nW (-0.3 nA at -1.8 V), fast 20-ns switching time, ultralow 8-fJ switching energy (4-V overstress), and excellent 10(6) cycling endurance. Such excellent performance was reached by using hopping conduction with negative temperature coefficient (TC) rather than the positive TC in metal-oxide RRAM.