12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---總計畫(III)

Full metadata record

DC Field	Value	Language
dc.contributor.author	林清發	en_US
dc.contributor.author	LIN TSING-FA	en_US
dc.date.accessioned	2014-12-13T10:34:53Z	-
dc.date.available	2014-12-13T10:34:53Z	-
dc.date.issued	2002	en_US
dc.identifier.govdoc	NSC91-2212-E009-038	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/93056	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=782996&docId=150396	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---總計畫(III)	zh_TW
dc.title	Research and Development of CVD Process Equipment for a 12-Inch Single Silicon Wafer and Growth of BST Dielectric Thin Film (III)	en_US
dc.type	Plan	en_US
dc.contributor.department	交通大學機械工程研究所	zh_TW
Appears in Collections:	Research Plans

Files in This Item:

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.