12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---總計畫(III)

標題:	12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---總計畫(III) Research and Development of CVD Process Equipment for a 12-Inch Single Silicon Wafer and Growth of BST Dielectric Thin Film (III)
作者:	林清發 LIN TSING-FA 交通大學機械工程研究所
公開日期:	2002
官方說明文件#:	NSC91-2212-E009-038
URI:	http://hdl.handle.net/11536/93056 https://www.grb.gov.tw/search/planDetail?id=782996&docId=150396
Appears in Collections:	Research Plans

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