完整後設資料紀錄
DC 欄位語言
dc.contributor.author崔秉鉞en_US
dc.contributor.authorBing-YueTsuien_US
dc.date.accessioned2014-12-13T10:35:25Z-
dc.date.available2014-12-13T10:35:25Z-
dc.date.issued2001en_US
dc.identifier.govdocNSC90-2215-E009-064zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/93429-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=665689&docId=126370en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subject金屬閘極zh_TW
dc.subject金氧半導體場效電晶體zh_TW
dc.subject關鍵技術zh_TW
dc.subjectMetal gateen_US
dc.subjectMOSFETen_US
dc.subjectKey technologyen_US
dc.title金屬閘極金氧半場效電晶體關鍵技術(I)zh_TW
dc.titleKey Technologies of Metal Gate MOSFET (I)en_US
dc.typePlanen_US
dc.contributor.department國立交通大學電子工程學系zh_TW
顯示於類別:研究計畫