完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.author | 曾俊元 | en_US |
| dc.contributor.author | TSEUNG-YUENTSENG | en_US |
| dc.date.accessioned | 2014-12-13T10:35:37Z | - |
| dc.date.available | 2014-12-13T10:35:37Z | - |
| dc.date.issued | 2001 | en_US |
| dc.identifier.govdoc | NSC90-2212-E009-076 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/93516 | - |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=662731&docId=125584 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 矽晶圓 | zh_TW |
| dc.subject | 化學氣相沉積法 | zh_TW |
| dc.subject | 鈦酸鍶鋇薄膜 | zh_TW |
| dc.subject | 介電薄膜 | zh_TW |
| dc.subject | Silicon wafer | en_US |
| dc.subject | Chemical vapor deposition (CVD) | en_US |
| dc.subject | BST thin film | en_US |
| dc.subject | Dielectric thin film | en_US |
| dc.title | 12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---子計畫Ⅲ：利用CVD法成長BST薄膜與特性分析(II) | zh_TW |
| dc.title | Growth and Characterizations of CVD BST Thin Films(II) | en_US |
| dc.type | Plan | en_US |
| dc.contributor.department | 國立交通大學電子工程學系 | zh_TW |
| 顯示於類別： | 研究計畫 | |
