標題: 銅導線及其障礙層之材質研究(II)
Microstructural Study of Copper Interconnect and Diffusion Barriers(II)
作者: 張立
CHANG LI
國立交通大學材料科學工程研究所
公開日期: 2000
官方說明文件#: NSC89-2218-E009-068
URI: http://hdl.handle.net/11536/93730
https://www.grb.gov.tw/search/planDetail?id=597337&docId=112563
Appears in Collections:Research Plans


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