標題: | 銅導線及其障礙層之材質研究(II) Microstructural Study of Copper Interconnect and Diffusion Barriers(II) |
作者: | 張立 CHANG LI 國立交通大學材料科學工程研究所 |
公開日期: | 2000 |
官方說明文件#: | NSC89-2218-E009-068 |
URI: | http://hdl.handle.net/11536/93730 https://www.grb.gov.tw/search/planDetail?id=597337&docId=112563 |
Appears in Collections: | Research Plans |
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