标题: | 寄生氧化层对具有原子层平坦之超薄氧化层的影响 The Effect of Native Oxide on Ultra-Thin Oxide (1.5-2.5nm) with Atomically Smooth Interface |
作者: | 荆凤德 CHIN ALBERT 交通大学电子工程系 |
关键字: | 寄生氧化层;超薄氧化层;迁移率;Native oxide;Ultra-thin oxide;Mobility |
公开日期: | 2000 |
官方说明文件#: | NSC89-2215-E009-071 |
URI: | http://hdl.handle.net/11536/93917 https://www.grb.gov.tw/search/planDetail?id=542127&docId=99589 |
显示于类别: | Research Plans |
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