| 標題: | 複晶矽鍺與MILC在低溫複晶矽薄膜電晶體上之應用---子計畫III：MILC低溫複晶矽薄膜電晶體之退火製程開發、新穎結構及小尺寸元件之製作及研究(I) Study of Low Temperautre MILC Poly-Si Film and Its Application on Novel Strucutre Small Dimensional TFTs (I) |
| 作者: | 張俊彥 CHANG CHUN-YEN 國立交通大學電子工程學系 |
| 關鍵字: | 低溫;多晶矽鍺;薄膜電晶體;退火製程;Low temperature;Poly SiGe;Thin film transistor (TFT);Annealing process |
| 公開日期: | 2001 |
| 官方說明文件#: | NSC90-2215-E009-078 |
| URI: | http://hdl.handle.net/11536/94109 https://www.grb.gov.tw/search/planDetail?id=665740&docId=126384 |
| Appears in Collections: | Research Plans |
