完整后设资料纪录
DC 栏位语言
dc.contributor.author黄调元en_US
dc.contributor.authorTIAO-YUANHUANGen_US
dc.date.accessioned2014-12-13T10:36:52Z-
dc.date.available2014-12-13T10:36:52Z-
dc.date.issued1999en_US
dc.identifier.govdocNSC88-2215-E009-030zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/94236-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=418076&docId=74161en_US
dc.description.sponsorship行政院国家科学委员会zh_TW
dc.language.isozh_TWen_US
dc.subject金氧半场效电晶体zh_TW
dc.subject窄线宽效应zh_TW
dc.subject桥接效应zh_TW
dc.subject深次微米zh_TW
dc.subjectMOSFETen_US
dc.subjectNarrow line-width effecten_US
dc.subjectBridging effecten_US
dc.subjectDeep submicrometeren_US
dc.title深次微米T型闸极金氧半电晶体之研制zh_TW
dc.titleDevelopment and Characterization of a Novel Method for Fabricating Deep-Micron Si MOSFET's with T-shaped Gateen_US
dc.typePlanen_US
dc.contributor.department交通大学电子工程系zh_TW
显示于类别:Research Plans


文件中的档案:

  1. 882215E009030.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.