電子束微影之鄰近效應修正

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	龍文安	en_US
dc.contributor.author	Loong Wen-an	en_US
dc.date.accessioned	2014-12-13T10:36:53Z	-
dc.date.available	2014-12-13T10:36:53Z	-
dc.date.issued	1999	en_US
dc.identifier.govdoc	NSC88-2215-E009-026	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/94250	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=418244&docId=74199	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	電子束	zh_TW
dc.subject	微影術	zh_TW
dc.subject	鄰近效應修正	zh_TW
dc.subject	充電效應	zh_TW
dc.subject	輸出量	zh_TW
dc.subject	E-beam	en_US
dc.subject	Lithography	en_US
dc.subject	Proximity effect correction	en_US
dc.subject	Changing effect	en_US
dc.subject	Throughput	en_US
dc.title	電子束微影之鄰近效應修正	zh_TW
dc.title	Proximity Correction of Electron Beam Lithography	en_US
dc.type	Plan	en_US
dc.contributor.department	交通大學應用化學系	zh_TW
顯示於類別：	研究計畫