| 標題: | 8吋矽晶圓半導體LPCVD製程設備之研發---子計畫I：LPCVD製程設備之加熱及進氣系統設計、流場模擬與系統整合及建立(III) Heating and Gas Feeding System Design, Flow Simulation, Design and Establishment of a LPCVD Process Equipment (III) |
| 作者: | 林清發 LIN TSING-FA 交通大學機械工程系 |
| 關鍵字: | 進氣系統;晶圓;熱傳導;催化劑;熱傳遞;反應器;Gas feeding system;Wafer;Thermal conductivity;Precursor;Heat transfer;Reactor |
| 公開日期: | 1999 |
| 官方說明文件#: | NSC88-2218-E009-002 |
| URI: | http://hdl.handle.net/11536/94315 https://www.grb.gov.tw/search/planDetail?id=419317&docId=74448 |
| Appears in Collections: | Research Plans |
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