嵌附式減光式相移光罩之模擬與製備

Full metadata record

DC Field	Value	Language
dc.contributor.author	龍文安	en_US
dc.contributor.author	Loong Wen-an	en_US
dc.date.accessioned	2014-12-13T10:37:46Z	-
dc.date.available	2014-12-13T10:37:46Z	-
dc.date.issued	1998	en_US
dc.identifier.govdoc	87-2215-E-009-053	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/94845	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=409017&docId=72411	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	微影成像	zh_TW
dc.subject	相移光罩	zh_TW
dc.subject	活性離子蝕刻	zh_TW
dc.subject	電子束微影	zh_TW
dc.subject	Microlithography	en_US
dc.subject	Phase-shifting mask	en_US
dc.subject	Reactive ion etching	en_US
dc.subject	E-beam lithography	en_US
dc.title	嵌附式減光式相移光罩之模擬與製備	zh_TW
dc.title	Simulation and Fabrication of Embedded Attenuated Phase-Shifting Mask	en_US
dc.type	Plan	en_US
dc.contributor.department	國立交通大學應用化學系	zh_TW
Appears in Collections:	Research Plans