完整後設資料紀錄
DC 欄位語言
dc.contributor.author龍文安en_US
dc.contributor.authorLoong Wen-anen_US
dc.date.accessioned2014-12-13T10:37:46Z-
dc.date.available2014-12-13T10:37:46Z-
dc.date.issued1998en_US
dc.identifier.govdoc87-2215-E-009-053zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/94845-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=409017&docId=72411en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subject微影成像zh_TW
dc.subject相移光罩zh_TW
dc.subject活性離子蝕刻zh_TW
dc.subject電子束微影zh_TW
dc.subjectMicrolithographyen_US
dc.subjectPhase-shifting masken_US
dc.subjectReactive ion etchingen_US
dc.subjectE-beam lithographyen_US
dc.title嵌附式減光式相移光罩之模擬與製備zh_TW
dc.titleSimulation and Fabrication of Embedded Attenuated Phase-Shifting Masken_US
dc.typePlanen_US
dc.contributor.department國立交通大學應用化學系zh_TW
顯示於類別:研究計畫