標題: 單晶CVD薄膜和熔化成長法製程中的不穩定熱流與使其穩定之研究---總計畫(III)
A Study of Generic Unstable Flow and Heat Transfer and Its Stabilization in CVD Thin Film and Melt Growth of Single Crystals (III)
作者: 林清發
LIN TSING-FA
交通大學機械工程系
關鍵字: 浮力;不穩定流;半導體;化學氣相沉積法;薄膜單晶;Buoyancy;Unstable flow;Semiconductor;Chemical vapor deposition (CVD);Thin film single crystal
公開日期: 1998
官方說明文件#: NSC87-2212-E009-028
URI: http://hdl.handle.net/11536/95032
https://www.grb.gov.tw/search/planDetail?id=353158&docId=63026
Appears in Collections:Research Plans


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