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dc.contributor.author王念夏en_US
dc.contributor.authorWANG NIANN SHIAHen_US
dc.date.accessioned2014-12-13T10:38:28Z-
dc.date.available2014-12-13T10:38:28Z-
dc.date.issued1997en_US
dc.identifier.govdocNSC86-2113-M009-013zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/95415-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=274248&docId=49072en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subject氟氯烷取代物zh_TW
dc.subject反應速率zh_TW
dc.subject甲硫基zh_TW
dc.subject臭氧zh_TW
dc.subjectFreon substituteen_US
dc.subjectReaction rateen_US
dc.subjectMethyl sulfuren_US
dc.subjectOzoneen_US
dc.title以雷射技術研究大氣化學之重要分子---(1)氟氯烷取代物研究---與OH之反應速率(2)硫化物氧化研究---CH/sub 3/S與O/sub 3/之反應速率zh_TW
dc.title(1) Freon Substitutes---Reaction Rates with OH (2)Oxidation of Sulfur Compounds---Reaction Rate of CH/sub 3/S+O/sub 3/en_US
dc.typePlanen_US
dc.contributor.department交通大學應用化學系zh_TW
Appears in Collections:Research Plans