完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.author | 王念夏 | en_US |
| dc.contributor.author | WANG NIANN SHIAH | en_US |
| dc.date.accessioned | 2014-12-13T10:38:28Z | - |
| dc.date.available | 2014-12-13T10:38:28Z | - |
| dc.date.issued | 1997 | en_US |
| dc.identifier.govdoc | NSC86-2113-M009-013 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/95415 | - |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=274248&docId=49072 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 氟氯烷取代物 | zh_TW |
| dc.subject | 反應速率 | zh_TW |
| dc.subject | 甲硫基 | zh_TW |
| dc.subject | 臭氧 | zh_TW |
| dc.subject | Freon substitute | en_US |
| dc.subject | Reaction rate | en_US |
| dc.subject | Methyl sulfur | en_US |
| dc.subject | Ozone | en_US |
| dc.title | 以雷射技術研究大氣化學之重要分子---(1)氟氯烷取代物研究---與OH之反應速率(2)硫化物氧化研究---CH/sub 3/S與O/sub 3/之反應速率 | zh_TW |
| dc.title | (1) Freon Substitutes---Reaction Rates with OH (2)Oxidation of Sulfur Compounds---Reaction Rate of CH/sub 3/S+O/sub 3/ | en_US |
| dc.type | Plan | en_US |
| dc.contributor.department | 交通大學應用化學系 | zh_TW |
| 顯示於類別： | 研究計畫 | |
