| 標題: | 以UHV/CVD低溫成長複晶薄膜及其金屬矽化物於次微米元件之應用 Low Temperature Growth of Polycrystalline Silicon by UHV/CVD and Its Metal Silicide for the Application of Submicron Devices |
| 作者: | 雷添福 LEI TAN-FU 國立交通大學電子工程研究所 |
| 公開日期: | 1996 |
| 官方說明文件#: | NSC85-2215-E009-051 |
| URI: | http://hdl.handle.net/11536/96018 https://www.grb.gov.tw/search/planDetail?id=218531&docId=38691 |
| 顯示於類別： | 研究計畫 |
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