完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 鄭晃忠 | en_US |
dc.date.accessioned | 2014-12-13T10:39:05Z | - |
dc.date.available | 2014-12-13T10:39:05Z | - |
dc.date.issued | 1996 | en_US |
dc.identifier.govdoc | NSC85-2215-E009-035 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/96065 | - |
dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=234557&docId=43052 | en_US |
dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.subject | 複晶矽薄膜電晶體 | zh_TW |
dc.subject | 複晶矽薄膜 | zh_TW |
dc.subject | 快速退火處理 | zh_TW |
dc.subject | 再結晶 | zh_TW |
dc.subject | Polysilicon thin film transistor | en_US |
dc.subject | Polysilicon thin film | en_US |
dc.subject | Rapid thermalprocess | en_US |
dc.subject | Recrystallization | en_US |
dc.title | 複晶矽薄膜電晶體相關技術之開發與研究---子計畫一:複晶矽薄膜電晶體之薄膜成長技術之研究 | zh_TW |
dc.title | Growth Technology of Polycrystalline Silicon Films for Poly-Si Thin-Film Transistors | en_US |
dc.type | Plan | en_US |
dc.contributor.department | 國立交通大學電子工程學系 | zh_TW |
顯示於類別: | 研究計畫 |