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dc.contributor.author黃調元en_US
dc.contributor.authorTIAO-YUANHUANGen_US
dc.date.accessioned2014-12-13T10:39:42Z-
dc.date.available2014-12-13T10:39:42Z-
dc.date.issued2001en_US
dc.identifier.govdocNSC90-2215-E009-080zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/96752-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=665749&docId=126386en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subject蕭特基能障zh_TW
dc.subject絕緣矽zh_TW
dc.subject金氧半導體場效電晶體zh_TW
dc.subjectSchotty barrieren_US
dc.subjectSilicon-on-insulator (SOI)en_US
dc.subjectMOSFETen_US
dc.title蕭特基能障金氧半電晶體元件研製與理論分析---子計畫II:蕭特基能障SOI金氧半電晶體元件研製與分析zh_TW
dc.titleFabrication and Characterization of SOI Schottky Barrier MOSFETen_US
dc.typePlanen_US
dc.contributor.department國立交通大學電子工程學系zh_TW
Appears in Collections:Research Plans


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