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公開日期標題作者
2012The effect of thermal annealing on the properties of IGZO TFT prepared by atmospheric pressure plasma jetWu, Chien-Hung; Chang, Kow-Ming; Huang, Sung-Hung; Deng, I-Chung; Wu, Chin-Jyi; Chiang, Wei-Han; Lin, Je-Wei; Chang, Chia-Chiang; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十月-2010Effect of ultraviolet light exposure on a HfO(x) RRAM deviceLiu, Kou-Chen; Tzeng, Wen-Hsien; Chang, Kow-Ming; Chan, Yi-Chun; Kuo, Chun-Chih; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十月-2010Effect of ultraviolet light exposure on a HfOx RRAM deviceLiu, Kou-Chen; Tzeng, Wen-Hsien; Chang, Kow-Ming; Chan, Yi-Chun; Kuo, Chun-Chih; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-六月-2015Effects of low-temperature Si buffer thickness and SiGe oxidation on sensitivity of Si1-xGex nanowireLai, Yi-Lung; Chang, Tai-Yuan; Chang, Kow-Ming; Chen, Chu-Feng; Lai, Chiung-Hui; Chen, Yi-Ming; Whang, Allen Jong-Woei; Lai, Hui-Lung; Chen, Huai-Yi; Wang, Shiu-Yu; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-七月-2020Effects of P-Type SnOx Thin-Film Transistors with N-2 and O-2 Ambient Furnace AnnealingZhang, Yu-Xin; Wu, Chien-Hung; Chang, Kow-Ming; Chen, Yi-Ming; Xu, Ni; Tsai, Kai-Chien; 電機學院; 電子工程學系及電子研究所; College of Electrical and Computer Engineering; Department of Electronics Engineering and Institute of Electronics
2007The effects of plasma treatment on the thermal stability of HfAlOx thin filmsChang, Kow-Ming; Chen, Bwo-Ning; Huang, Shih-Ming; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
30-七月-2008The effects of plasma treatment on the thermal stability of HfO(2) thin filmsChang, Kow-Ming; Chen, Bwo-Ning; Huang, Shih-Ming; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2012Electrical Improvement of MIS Capacitor with HfAlOx Gate Dielectrics Treated by Dual Plasma TreatmentDeng, I-Chung; Chang, Kow-Ming; Chang, Ting-Chia; Chang, Po-Chun; Huang, Bo-Wen; Wu, Chien-Hung; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
15-一月-2014Electrical properties of SiGe nanowire following fluorine/nitrogen plasma treatmentChang, Kow-Ming; Chen, Chu-Feng; Lai, Chiung-Hui; Kuo, Po-Shen; Chen, Yi-Ming; Chang, Tai-Yuan; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2-十二月-2013Enhancement of the light-scattering ability of Ga-doped ZnO thin films using SiOx nano-films prepared by atmospheric pressure plasma deposition systemChang, Kow-Ming; Ho, Po-Ching; Ariyarit, Atthaporn; Yang, Kuo-Hui; Hsu, Jui-Mei; Wu, Chin-Jyi; Chang, Chia-Chiang; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2009FUNDAMENTAL UNDERSTANDING OF POROUS LOW-K DIELECTRIC BREAKDOWNLee, Shou-Chung; Oates, A. S.; Chang, Kow-Ming; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2008The Ge Enhance the Sensitivity for Bio-SensorChang, Kow-Ming; Kuo, Jiun-Ming; Chao, Wen-Chan; Liang, Chia-Jung; Wu, Heng-Hsin; Tzeng, Wen-Hsien; Wu, Tzu-liu; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-九月-2010Geometric Variability of Nanoscale Interconnects and Its Impact on the Time-Dependent Breakdown of Cu/Low-k DielectricsLee, Shou-Chung; Oates, Anthony S.; Chang, Kow-Ming; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
6-十一月-2014High-performance HfO2/ZrO2/IGZO thin-film transistors deposited using atmospheric pressure plasma jetWu, Chien-Hung; Chang, Kow-Ming; Hsu, Hsin-Yu; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2008Higher Drive Current for SiGe NanowiresChang, Kow-Ming; Kuo, Jiun-Ming; Wu, Heng-Hsin; Tzeng, Wen-Hsien; Wu, Tzu-liu; Chao, Wen-Chan; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2009The Improvement Effect of the Plasma Nitridation Process to the Reliability of HfO(2) thin filmsChang, Kow-Ming; Chen, Bwo-Ning; Tang, Chun-Kai; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2011Improvement on Electrical Characteristics of HfO2 MIS Capacitor with Dual Plasma TreatmentChang, Kow-Ming; Chang, Ting-Chia; Chen, Hshu-Wei; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2012Improvement on Interface Quality and Reliability Properties of HfAlOx MIS Capacitor with Dual Plasma TreatmentChang, Kow-Ming; Chang, Ting-Chia; Chang, Po-Chun; Huang, Bo-Wen; Wu, Chien-Hung; Deng, I-Chung; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-一月-2015Improving Crystalline Silicon Solar Cell Efficiency Using Graded-Refractive-Index SiON/ZnO NanostructuresTu, Yung-Chun; Wang, Shui-Jinn; Wu, Chien-Hung; Chang, Kow-Ming; Lin, Tseng-Hsing; Hung, Chien-Hsiung; Wu, Jhen-Siang; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2014The Influence of NH3 Plasma Treatment on Al2O3/HfO2 Gate Dielectrics of TFTs with Atmospheric Pressure Plasma Jet Deposited IGZO ChannelHuang, Hau-Yuan; Wu, Chien-Hung; Wang, Shui-Jinn; Chang, Kow-Ming; Hsu, Hsin-Yu; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics