Title: 高密度電漿源設計製作及其應用在半導體製程發展(III)
Development of High Density Plasma Sources for VLSI/ULSI Processing (III)
Authors: 蔡春鴻
C.H.Tsai
交通大學電信工程系
Keywords: 電漿源;超大型積體電路;極大型積體電路;Plasma source;VLSI;ULSI
Issue Date: 2000
Gov't Doc #: NSC89-CS-D009-014
URI: http://hdl.handle.net/11536/101326
https://www.grb.gov.tw/search/planDetail?id=542283&docId=99633
Appears in Collections:Research Plans