Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 蔡春鴻 | en_US |
| dc.contributor.author | C.H.Tsai | en_US |
| dc.date.accessioned | 2014-12-13T10:48:23Z | - |
| dc.date.available | 2014-12-13T10:48:23Z | - |
| dc.date.issued | 2000 | en_US |
| dc.identifier.govdoc | NSC89-CS-D009-014 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/101326 | - |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=542283&docId=99633 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 電漿源 | zh_TW |
| dc.subject | 超大型積體電路 | zh_TW |
| dc.subject | 極大型積體電路 | zh_TW |
| dc.subject | Plasma source | en_US |
| dc.subject | VLSI | en_US |
| dc.subject | ULSI | en_US |
| dc.title | 高密度電漿源設計製作及其應用在半導體製程發展(III) | zh_TW |
| dc.title | Development of High Density Plasma Sources for VLSI/ULSI Processing (III) | en_US |
| dc.type | Plan | en_US |
| dc.contributor.department | 交通大學電信工程系 | zh_TW |
| Appears in Collections: | Research Plans | |
