| 標題: | Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode |
| 作者: | Cheng, Chun-Hu Chiang, Kuo-Cheng Pan, Han-Chang Hsiao, Chien-Nan Chou, Chang-Pin Mcalister, Sean P. Chin, Albert 機械工程學系 電子工程學系及電子研究所 Department of Mechanical Engineering Department of Electronics Engineering and Institute of Electronics |
| 關鍵字: | reliability;high work function;MIM;TiHfO;Ni |
| 公開日期: | 1-十一月-2007 |
| 摘要: | We have studied the reliability of high-K (K similar to 49) TixHf1-xO (x similar to 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction. |
| URI: | http://dx.doi.org/10.1143/JJAP.46.7300 http://hdl.handle.net/11536/10148 |
| ISSN: | 0021-4922 |
| DOI: | 10.1143/JJAP.46.7300 |
| 期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS |
| Volume: | 46 |
| Issue: | 11 |
| 起始頁: | 7300 |
| 結束頁: | 7302 |
| 顯示於類別： | 期刊論文 |
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- High-temperature leakage improvement in metal-insulator-metal capacitors by work-function tuning / Chiang, K. C.;Cheng, C. H.;Pan, H. C.;Hsiao, N.;Chou, C. P.
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- Improvement of the performance of TiHfO MIM capacitors by using a dual plasma treatment of the lower electrode / Cheng, C. H.;Pan, H. C.;Huang, C. C.;Chou, C. P.;Hsiao, C. N.
- Improved Capacitance Density and Reliability of High-k Ni/ZrO2/TiN MIM Capacitors Using Laser-Annealing Technique / Tsai, C. Y.;Chiang, K. C.;Lin, S. H.;Hsu, K. C.;Chi, C. C.
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