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dc.contributor.author林清發en_US
dc.contributor.authorLIN TSING-FAen_US
dc.date.accessioned2014-12-13T10:51:45Z-
dc.date.available2014-12-13T10:51:45Z-
dc.date.issued2000en_US
dc.identifier.govdocNSC89-2212-E009-078zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/102869-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=549676&docId=101492en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.title12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---總計畫 (I)zh_TW
dc.titleResearch and Development of CVD Process Equipment for a 12-inch Single Silicon Wafer and Growth of BST Dielectric Thin Film(I)en_US
dc.typePlanen_US
dc.contributor.department國立交通大學機械工程研究所zh_TW
Appears in Collections:Research Plans