標題: METHOD FOR GROWING EPITAXIAL DIAMOND
作者: CHANG Li
WU Ping-Hsun
CHIU Kun-An
公開日期: 22-五月-2014
摘要: A method for growing epitaxial diamond is provided here. A metallic layer is deposited on a diamond substrate and is followed by an epitaxial diamond film deposited on top of the metallic layer. As a buffer layer, the metallic layer relieves stress accumulated in the thin film of the epitaxial diamond to prevent cracks. In consequence, diamond epitaxial layers with desired thickness and good quality can be obtained.
官方說明文件#: C30B025/18
URI: http://hdl.handle.net/11536/104918
專利國: USA
專利號碼: 20140137795
顯示於類別:專利資料


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