標題: | Design of mixed-voltage I/O buffer by using NMOS-blocking technique |
作者: | Ker, Ming-Dou Chen, Shih-Lun 電機學院 College of Electrical and Computer Engineering |
關鍵字: | gate-oxide reliability;hot-carrier degradation;interface;junction breakdown;mixed-voltage I/O buffer |
公開日期: | 1-Oct-2006 |
摘要: | An nMOS-blocking technique for mixed-voltage I/O buffer realized with only 1 x V-DD devices can receive 2 x V-DD, 3 x V-DD, and even 4 x V-DD input signal without the gate-oxide reliability issue is proposed. In this paper, the 2 x V-DD input tolerant mixed-voltage I/O buffer by using the nMOS-blocking technique has been verified in a 0.25-mu m 2.5-V CMOS process to serve 2.5/5-V mixed-voltage interface. The 3 x V-DD input tolerant mixed-voltage I/O buffer by using the nMOS-blocking technique has been verified in a 0.13-mu m 1-V CMOS process to serve 1/3-V mixed-voltage interface. The proposed nMOS-blocking technique can be extended to design the 4 x V-DD, 5 x V-DD, and even 6 x V-DD input tolerant mixed-voltage I/O buffers. The limitation of the nMOS-blocking technique is the breakdown voltage of the pn-junction in the given CMOS process. |
URI: | http://dx.doi.org/10.1109/JSSC.2006.881546 http://hdl.handle.net/11536/11710 |
ISSN: | 0018-9200 |
DOI: | 10.1109/JSSC.2006.881546 |
期刊: | IEEE JOURNAL OF SOLID-STATE CIRCUITS |
Volume: | 41 |
Issue: | 10 |
起始頁: | 2324 |
結束頁: | 2333 |
Appears in Collections: | Articles |
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