標題: | High-Performance Submicrometer ZnON Thin-Film Transistors With Record Field-Effect Mobility |
作者: | Kuan, Chin-I Lin, Horng-Chih Li, Pei-Wen Huang, Tiao-Yuan 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | Zinc oxynitride (ZnON);oxide semiconductors;mobility;thin-film transistors (TFTs);submicron |
公開日期: | Mar-2016 |
摘要: | In this letter, we demonstrate 0.6-mu m ZnON thin-film transistors (TFTs) with the field-effect mobility of 71 cm(2)/V-sec, which to the best of our knowledge is the highest value ever reported on submicrometer oxide-semiconductor TFTs. The drive current, field-effect mobility, and subthreshold slope of ZnON TFTs are significantly improved as compared with their counterpart ZnO TFTs of the same channel dimensions and structure. Such an improvement in the field-effect mobility primarily results from a considerable reduction in the series source/drain (S/D) resistances because of suppression in an interfacial layer formation between Al S/D pads and the channel layer. |
URI: | http://dx.doi.org/10.1109/LED.2016.2518404 http://hdl.handle.net/11536/133505 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2016.2518404 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 37 |
Issue: | 3 |
起始頁: | 303 |
結束頁: | 305 |
Appears in Collections: | Articles |