標題: High-Performance Submicrometer ZnON Thin-Film Transistors With Record Field-Effect Mobility
作者: Kuan, Chin-I
Lin, Horng-Chih
Li, Pei-Wen
Huang, Tiao-Yuan
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: Zinc oxynitride (ZnON);oxide semiconductors;mobility;thin-film transistors (TFTs);submicron
公開日期: 三月-2016
摘要: In this letter, we demonstrate 0.6-mu m ZnON thin-film transistors (TFTs) with the field-effect mobility of 71 cm(2)/V-sec, which to the best of our knowledge is the highest value ever reported on submicrometer oxide-semiconductor TFTs. The drive current, field-effect mobility, and subthreshold slope of ZnON TFTs are significantly improved as compared with their counterpart ZnO TFTs of the same channel dimensions and structure. Such an improvement in the field-effect mobility primarily results from a considerable reduction in the series source/drain (S/D) resistances because of suppression in an interfacial layer formation between Al S/D pads and the channel layer.
URI: http://dx.doi.org/10.1109/LED.2016.2518404
http://hdl.handle.net/11536/133505
ISSN: 0741-3106
DOI: 10.1109/LED.2016.2518404
期刊: IEEE ELECTRON DEVICE LETTERS
Volume: 37
Issue: 3
起始頁: 303
結束頁: 305
顯示於類別:期刊論文