標題: Electron-phonon-impurity interference effect in disordered Au56Pd44 and IrO2 thick films
作者: Yeh, SS
Lin, JJ
Jing, XN
Zhang, DL
電子物理學系
物理研究所
Department of Electrophysics
Institute of Physics
公開日期: 1-七月-2005
摘要: We have fabricated a series of Au56Pd44 thick films with a wide range of residual resistivity rho(0) varying from 40 to 280 mu Omega cm. The resistivities of these films were measured between 15 and 300 K. We found that at temperatures below about 0.1 theta(D) (theta(D) is the Debye temperature), the interference mechanism between the elastic electron scattering and electron-phonon scattering (the electron-phonon-impurity interference effect) contributes significantly to the measured resistivities. Our results support the current theoretical idea that this interference-mechanism-induced resistivity varies with rho(0)T(2), where T is the temperature. Similar observation has also been made in disordered, conducting transition-metal oxide IrO2 thick films.
URI: http://dx.doi.org/10.1103/PhysRevB.72.024204
http://hdl.handle.net/11536/13503
ISSN: 1098-0121
DOI: 10.1103/PhysRevB.72.024204
期刊: PHYSICAL REVIEW B
Volume: 72
Issue: 2
起始頁: 0
結束頁: 0
顯示於類別:期刊論文


文件中的檔案:

  1. 1b452b3e58eb602e7f67494eb3001828.pdf

若為 zip 檔案,請下載檔案解壓縮後,用瀏覽器開啟資料夾中的 index.html 瀏覽全文。