標題: InGaAs Junctionless FinFETs With Self-Aligned Ni-InGaAs S/D
作者: Chang, Po-Chun
Hsiao, Chih-Jen
Lumbantoruan, Franky Juanda
Wu, Chia-Hsun
Lin, Yen-Ku
Lin, Yueh-Chin
Sze, Simon M.
Chang, Edward Yi
材料科學與工程學系
電子工程學系及電子研究所
Department of Materials Science and Engineering
Department of Electronics Engineering and Institute of Electronics
關鍵字: Junctionless (JL) transistor;InGaAs nMOSFETs;FinFET;high-k dielectric;Ni-InGaAs;metal source/drain
公開日期: 1-一月-2018
摘要: In this paper, the InGaAs junctionless (JL) FinFET with notable electrical performance is demonstrated. The device with W-fin down to 20 nm, EOT of 2.1 nm, and L-G = 60 nm shows high I-ON = 188 mu A/mu m at V-DD = 0.5 V and I-OFF = 100 nA/mu m, I-ON/I-OFF = 5 x 10(5), DIBL = 106 mV/V and SS = 96 mV/dec. The device also exhibits a decent extrinsic transconductance (G(m)) of 1142 mu S/mu m at V-DS of 0.5 V. This high performance is attributed to the moderate doping concentration to ensure the channel carriers could be effectively depleted and the low R-SD realized by self-aligned Ni-InGaAs alloy S/D. Furthermore, we also examine the temperature dependence of the main electrical parameters of the JL transistor.
URI: http://dx.doi.org/10.1109/JEDS.2018.2859811
http://hdl.handle.net/11536/147994
ISSN: 2168-6734
DOI: 10.1109/JEDS.2018.2859811
期刊: IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY
Volume: 6
起始頁: 856
結束頁: 860
顯示於類別:期刊論文