標題: | InGaAs Junctionless FinFETs With Self-Aligned Ni-InGaAs S/D |
作者: | Chang, Po-Chun Hsiao, Chih-Jen Lumbantoruan, Franky Juanda Wu, Chia-Hsun Lin, Yen-Ku Lin, Yueh-Chin Sze, Simon M. Chang, Edward Yi 材料科學與工程學系 電子工程學系及電子研究所 Department of Materials Science and Engineering Department of Electronics Engineering and Institute of Electronics |
關鍵字: | Junctionless (JL) transistor;InGaAs nMOSFETs;FinFET;high-k dielectric;Ni-InGaAs;metal source/drain |
公開日期: | 1-Jan-2018 |
摘要: | In this paper, the InGaAs junctionless (JL) FinFET with notable electrical performance is demonstrated. The device with W-fin down to 20 nm, EOT of 2.1 nm, and L-G = 60 nm shows high I-ON = 188 mu A/mu m at V-DD = 0.5 V and I-OFF = 100 nA/mu m, I-ON/I-OFF = 5 x 10(5), DIBL = 106 mV/V and SS = 96 mV/dec. The device also exhibits a decent extrinsic transconductance (G(m)) of 1142 mu S/mu m at V-DS of 0.5 V. This high performance is attributed to the moderate doping concentration to ensure the channel carriers could be effectively depleted and the low R-SD realized by self-aligned Ni-InGaAs alloy S/D. Furthermore, we also examine the temperature dependence of the main electrical parameters of the JL transistor. |
URI: | http://dx.doi.org/10.1109/JEDS.2018.2859811 http://hdl.handle.net/11536/147994 |
ISSN: | 2168-6734 |
DOI: | 10.1109/JEDS.2018.2859811 |
期刊: | IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY |
Volume: | 6 |
起始頁: | 856 |
結束頁: | 860 |
Appears in Collections: | Articles |