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dc.contributor.authorWang, YPen_US
dc.contributor.authorLee, WIen_US
dc.contributor.authorTseng, TYen_US
dc.date.accessioned2019-04-02T05:58:33Z-
dc.date.available2019-04-02T05:58:33Z-
dc.date.issued1996-09-16en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.117493en_US
dc.identifier.urihttp://hdl.handle.net/11536/149303-
dc.description.abstractThe degradation of non-Ohmic electrical characteristics of ZnO-glass chip varistors due to high-intensity impulse currents was correlated with the deep trap levels investigated by means of deep level transient spectroscopy. Three electron traps located at 0.11, 0.27, and 0.94 eV below the conduction band were observed for chip varistors before current impulse testing. These trap energy depths of the chip varistors after current impulse testing were found to be almost unchanged, but their trap densities and capture cross sections both decreased. The concentration of the trap at 0.94 eV was decreased and ascribed to oxygen vacancies existing at the grain boundaries of the varistor. The electrical degradation phenomenon of the chip varistors is closely related to the reaction between the trap at 0.94 eV and adsorbed oxygen ions at the grain boundaries. (C) 1996 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleDegradation phenomena of multilayer ZnO-glass varistors studied by deep level transient spectroscopyen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.117493en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume69en_US
dc.citation.spage1807en_US
dc.citation.epage1809en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1996VG93400052en_US
dc.citation.woscount81en_US
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