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dc.contributor.authorVasudevan, Rama K.en_US
dc.contributor.authorChen, Yi-Chunen_US
dc.contributor.authorTai, Hsiang-Huaen_US
dc.contributor.authorBalke, Ninaen_US
dc.contributor.authorWu, Pingpingen_US
dc.contributor.authorBhattacharya, Saswataen_US
dc.contributor.authorChen, L. Q.en_US
dc.contributor.authorChu, Ying-Haoen_US
dc.contributor.authorLin, I-Nanen_US
dc.contributor.authorKalinin, Sergei V.en_US
dc.contributor.authorNagarajan, Valanooren_US
dc.date.accessioned2019-04-02T05:59:53Z-
dc.date.available2019-04-02T05:59:53Z-
dc.date.issued2011-02-01en_US
dc.identifier.issn1936-0851en_US
dc.identifier.urihttp://dx.doi.org/10.1021/nn102099zen_US
dc.identifier.urihttp://hdl.handle.net/11536/150249-
dc.description.abstractUsing a combination of piezoresponse force microscopy (PFM) and phase-field modeling, we demonstrate ubiquitous formation of center-type and possible ferroelectric closure domain arrangements during polarization switching near the ferroelastic domain walls in (100) oriented rhombohedral BiFeO3. The formation of these topological defects is determined from the vertical and lateral PFM data and confirmed from the reversible changes in surface topography. These observations provide insight into the mechanisms of tip-induced ferroelastic domain control and suggest that formation of topological defect states under the action of local defect- and tip-induced fields is much more common than previously believed.en_US
dc.language.isoen_USen_US
dc.subjectBiFeO3en_US
dc.subjectclosure-domainen_US
dc.subjecttopological defectsen_US
dc.subjectmultiferroicen_US
dc.subjectthin-filmen_US
dc.subjectPPMen_US
dc.titleExploring Topological Defects in Epitaxial BiFeO3 Thin Filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/nn102099zen_US
dc.identifier.journalACS NANOen_US
dc.citation.volume5en_US
dc.citation.spage879en_US
dc.citation.epage887en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000287553800022en_US
dc.citation.woscount66en_US
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