Title: Exploring Topological Defects in Epitaxial BiFeO(3) Thin Films
Authors: Vasudevan, Rama K.
Chen, Yi-Chun
Tai, Hsiang-Hua
Balke, Nina
Wu, Pingping
Bhattacharya, Saswata
Chen, L. Q.
Chu, Ying-Hao
Lin, I-Nan
Kalinin, Sergei V.
Nagarajan, Valanoor
材料科學與工程學系
Department of Materials Science and Engineering
Issue Date: 1-Feb-2011
Abstract: Using a combination of piezoresponse force microscopy (PFM) and phase-field modeling, we demonstrate ubiquitous formation of center-type and possible ferroelectric closure domain arrangements during polarization switching near the ferroelastic domain walls in (100) oriented rhombohedral BiFeO(3). The formation of these topological defects is determined from the vertical and lateral PFM data and confirmed from the reversible changes in surface topography. These observations provide insight into the mechanisms of tip-induced ferroelastic domain control and suggest that formation of topological defect states under the action of local defect- and tip-induced fields is much more common than previously believed.
URI: http://dx.doi.org/10.1021/nn102099z
http://hdl.handle.net/11536/25811
ISSN: 1936-0851
DOI: 10.1021/nn102099z
Journal: ACS NANO
Volume: 5
Issue: 2
Begin Page: 879
End Page: 887
Appears in Collections:Articles