Thin Film Silicon Solar Cell Fabricated at 100 degrees C by High Density Plasma for Flexible Photovoltaic Application

Title:	Thin Film Silicon Solar Cell Fabricated at 100 degrees C by High Density Plasma for Flexible Photovoltaic Application
Authors:	Shen, Chang-Hong Shieh, Jia-Min Kuo, Hao-Chung Huang, Jung Y. Yu, Wen-Chien Huang, Wen-Hsien Wang, Chao-Kei Hsu, Chih-Wei Lin, Yu-Hsin Chiu, Hung-Yu Dai, Bau-Tong Yang, Fu-Liang 光電工程學系 Department of Photonics
Issue Date:	1-Jan-2010
Abstract:	Record fabrication temperature, 100 degrees C, of a single junction amorphous Si solar cell was demonstrated by a high-density plasma method. Present solar cell revealed conversion efficiency of 7.4% at 200 degrees C (4.1% at 135 degrees C). (C) 2009 Optical Society of America
URI:	http://hdl.handle.net/11536/150526
Journal:	2010 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) AND QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (QELS)
Appears in Collections:	Conferences Paper