標題: Thin Film Silicon Solar Cell Fabricated at 100 degrees C by High Density Plasma for Flexible Photovoltaic Application
作者: Shen, Chang-Hong
Shieh, Jia-Min
Kuo, Hao-Chung
Huang, Jung Y.
Yu, Wen-Chien
Huang, Wen-Hsien
Wang, Chao-Kei
Hsu, Chih-Wei
Lin, Yu-Hsin
Chiu, Hung-Yu
Dai, Bau-Tong
Yang, Fu-Liang
光電工程學系
Department of Photonics
公開日期: 1-Jan-2010
摘要: Record fabrication temperature, 100 degrees C, of a single junction amorphous Si solar cell was demonstrated by a high-density plasma method. Present solar cell revealed conversion efficiency of 7.4% at 200 degrees C (4.1% at 135 degrees C). (C) 2009 Optical Society of America
URI: http://hdl.handle.net/11536/150526
期刊: 2010 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) AND QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (QELS)
Appears in Collections:Conferences Paper