標題: | Wavefront-based pixel inversion algorithm for generation of subresolution assist features |
作者: | Yu, Jue-Chin Yu, Peichen Chao, Hsueh-Yung 光電工程學系 Department of Photonics |
關鍵字: | optical proximity correction;inverse lithography;subresolution assist features |
公開日期: | 1-Oct-2011 |
摘要: | The generation of subresolution assist features (SRAFs) using inverse-lithography techniques demands extensive computational resources which limits its deployment in advanced CMOS nodes. In this paper, we propose a wavefront-based pixel inversion algorithm to quickly obtain inverse masks with a high aerial image quality. Further assisted by a flexible pattern simplification technique, we present effective SRAF generation and placement based on the calculated inverse mask. The proposed approach can be easily inserted prior to a conventional mask correction flow for subsequent concurrent optimizations of both drawn patterns and SRAFs. The innovative pixel inversion and pattern simplification techniques allow quality mask corrections as produced by inverse lithography while maintaining the convenience of standardized/validated process flows currently used in the industry. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI:10.1117/1.3663249] |
URI: | http://dx.doi.org/10.1117/1.3663249 http://hdl.handle.net/11536/15075 |
ISSN: | 1932-5150 |
DOI: | 10.1117/1.3663249 |
期刊: | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS |
Volume: | 10 |
Issue: | 4 |
結束頁: | |
Appears in Collections: | Articles |
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