Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | You, Wei-Xiang | en_US |
dc.contributor.author | Su, Pin | en_US |
dc.contributor.author | Hu, Chenming | en_US |
dc.date.accessioned | 2019-05-02T00:25:52Z | - |
dc.date.available | 2019-05-02T00:25:52Z | - |
dc.date.issued | 2019-04-01 | en_US |
dc.identifier.issn | 0018-9383 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/TED.2019.2898445 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/151607 | - |
dc.description.abstract | This paper examines metal-ferroelectric-insulator-semiconductor negative-capacitance FinFET (NC-FinFET) based VLSI subsystem-level logic circuits. For the first time, with the aid of a short-channel NC-FinFET compact model, we confirm the functionality and evaluate the standby-power/switching-energy/delay performance of large logic circuits (e.g., dynamic 4-bit Manchester carry-chain adder and the formal hierarchical 32-bit carry-look-ahead adder) employing 14-nm ultra-low-power NC-FinFETs. Our study indicates that the inverse V-ds-dependence of threshold voltage (V-T), also known as the negative drain-induced barrier lowering, of negative-capacitance field-effect transistor is not only acceptable but also beneficial for the speed performance of both the static and pass-transistor logic (PTL) circuits, especially for the PTL at low V-DD. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Dynamic adder | en_US |
dc.subject | FinFET | en_US |
dc.subject | Landau-Khalatnikov (L-K) equation | en_US |
dc.subject | logic circuits | en_US |
dc.subject | metal-ferroelectric-insulator-semiconductor (MFIS)-type negative-capacitance field-effect transistor (NCFET) | en_US |
dc.subject | NCFET | en_US |
dc.subject | pass-transistor logic (PTL) | en_US |
dc.title | Evaluation of NC-FinFET Based Subsystem-Level Logic Circuits | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/TED.2019.2898445 | en_US |
dc.identifier.journal | IEEE TRANSACTIONS ON ELECTRON DEVICES | en_US |
dc.citation.volume | 66 | en_US |
dc.citation.issue | 4 | en_US |
dc.citation.spage | 2004 | en_US |
dc.citation.epage | 2009 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | 國際半導體學院 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.contributor.department | International College of Semiconductor Technology | en_US |
dc.identifier.wosnumber | WOS:000461838600062 | en_US |
dc.citation.woscount | 0 | en_US |
Appears in Collections: | Articles |