標題: | Wide bandwidth AlAs/AlGaAs tandem Bragg reflectors grown by organometallic vapor phase epitaxy |
作者: | Lee, WI 交大名義發表 電子物理學系 National Chiao Tung University Department of Electrophysics |
公開日期: | 18-十二月-1995 |
摘要: | Wide bandwidth AlAs/Al0.6Ga0.4As tandem Bragg reflectors were grown by organometallic vapor phase epitaxy. Quarter-wave reflector stacks designed for different wavelengths were placed in cascade in epitaxially grown structures to expand the high reflectance bands. Intermediate low-index layers were put in between every two stacks to suppress the transmission peaks in the centers of the combined high reflectance bands. While a single-stack structure showed a full width half-maximum bandwidth of 500 Angstrom, the two-stack and the three-stack structures effectively doubled and tripled this bandwidth to approximately 1000 and 1500 Angstrom, respectively. (C) 1995 American Institute of Physics. |
URI: | http://dx.doi.org/10.1063/1.115372 http://hdl.handle.net/11536/1593 |
ISSN: | 0003-6951 |
DOI: | 10.1063/1.115372 |
期刊: | APPLIED PHYSICS LETTERS |
Volume: | 67 |
Issue: | 25 |
起始頁: | 3753 |
結束頁: | 3755 |
顯示於類別: | 期刊論文 |