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dc.contributor.authorKer, MDen_US
dc.contributor.authorPeng, JJen_US
dc.contributor.authorJiang, HCen_US
dc.date.accessioned2014-12-08T15:26:13Z-
dc.date.available2014-12-08T15:26:13Z-
dc.date.issued2003en_US
dc.identifier.isbn0-7803-7653-6en_US
dc.identifier.urihttp://hdl.handle.net/11536/18613-
dc.description.abstractFor saving the layout area of I/O cells in SOC chips, a test chip with large size NMOS devices placed under bond pads has been fabricated in 0.35-mum 1P4M 3.3V CMOS process for verification. The bond pads had been drawn with different layout patterns on the inter-layer metals to investigate the impact of bonding stress on the active devices under the pads. The measurement results, including thermal shock and temperature cycling tests, show that there are only little variations between devices under bond pads and devices beside bond pads. This discovery can be applied to save layout area for on-chip ESD protection devices or I/O devices of IC products, especially for the high-pin-count SOC IC's.en_US
dc.language.isoen_USen_US
dc.titleTest structure and verification on the MOSFET under bond pad for area-efficient I/O layout in high-pin-count SOCIC'sen_US
dc.typeProceedings Paperen_US
dc.identifier.journalICMTS 2003: PROCEEDINGS OF THE 2003 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURESen_US
dc.citation.spage161en_US
dc.citation.epage166en_US
dc.contributor.department電機學院zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000182493300029-
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