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dc.contributor.authorKer, MDen_US
dc.contributor.authorJiang, HCen_US
dc.contributor.authorChang, CYen_US
dc.date.accessioned2014-12-08T15:27:06Z-
dc.date.available2014-12-08T15:27:06Z-
dc.date.issued2000en_US
dc.identifier.isbn0-7803-6598-4en_US
dc.identifier.issn1063-0988en_US
dc.identifier.urihttp://hdl.handle.net/11536/19332-
dc.description.abstractA new structure of bond pad is proposed to reduce its parasitic capacitance in a baseline CMOS process without any process modification. The proposed bond pad has a capacitance less than 50% of that in the traditional bond pad. In addition, this new bond pad also provides better bonding adhesion of 10% improvement than the traditional one. It is greatly useful for high-frequency IC's, which need a very low input capacitance.en_US
dc.language.isoen_USen_US
dc.titleDesign of low-capacitance bond pad for high-frequency I/O applications in CMOS integrated circuitsen_US
dc.typeProceedings Paperen_US
dc.identifier.journal13TH ANNUAL IEEE INTERNATIONAL ASIC/SOC CONFERENCE, PROCEEDINGSen_US
dc.citation.spage293en_US
dc.citation.epage296en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000165305200055-
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