標題: | A NOVEL EXTRACTION TECHNIQUE FOR THE EFFECTIVE CHANNEL-LENGTH OF MOSFET DEVICES |
作者: | LI, HH WU, CY 電控工程研究所 Institute of Electrical and Control Engineering |
公開日期: | 1-May-1995 |
摘要: | A novel method using the charge pumping technique for extracting the effective channel length of MOSFET devices is presented, in which the effective area approach is used and the edges of the area are defined clearly. It is shown that the extracted effective channel length is independent of the measuring biases and the proposed new method is simple, accurate, and reliable, as compared to those using the I-V method. With the knowledge of the device dopant profiles, the extracted channel length with 0.01 mu m accuracy can be achieved. Moreover, the proposed method is applicable to either n- or p-channel, conventional or LDD, surface or buried channel MOSFET's. |
URI: | http://dx.doi.org/10.1109/16.381980 http://hdl.handle.net/11536/1962 |
ISSN: | 0018-9383 |
DOI: | 10.1109/16.381980 |
期刊: | IEEE TRANSACTIONS ON ELECTRON DEVICES |
Volume: | 42 |
Issue: | 5 |
起始頁: | 856 |
結束頁: | 863 |
Appears in Collections: | Articles |
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