Selective SiO2-xFx growth with liquid-phase deposition for MEMS technology

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Yeh, CF	en_US
dc.contributor.author	Lee, YC	en_US
dc.contributor.author	Su, JL	en_US
dc.date.accessioned	2014-12-08T15:27:34Z	-
dc.date.available	2014-12-08T15:27:34Z	-
dc.date.issued	1996	en_US
dc.identifier.isbn	0-8194-2277-0	en_US
dc.identifier.uri	http://hdl.handle.net/11536/19813	-
dc.language.iso	en_US	en_US
dc.subject	low-stress	en_US
dc.subject	liquid phase deposition	en_US
dc.subject	LPD	en_US
dc.subject	SiO2-xFx	en_US
dc.subject	selective deposition	en_US
dc.title	Selective SiO2-xFx growth with liquid-phase deposition for MEMS technology	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.journal	MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY II	en_US
dc.citation.volume	2879	en_US
dc.citation.spage	260	en_US
dc.citation.epage	265	en_US
dc.contributor.department	電子工程學系及電子研究所	zh_TW
dc.contributor.department	Department of Electronics Engineering and Institute of Electronics	en_US
dc.identifier.wosnumber	WOS:A1996BG41M00027	-
顯示於類別：	會議論文