标题: | MICROCRYSTALLINE beta-SIC GROWTH ON SI BY ECR-CVD AT 500 degrees C |
作者: | CHENG, KL LIU, CC CHENG, HC LEE, CY YEW, TR 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公开日期: | 1995 |
URI: | http://hdl.handle.net/11536/19967 |
ISBN: | 1-55899-259-6 |
ISSN: | 0272-9172 |
期刊: | MICROCRYSTALLINE AND NANOCRYSTALLINE SEMICONDUCTORS |
Volume: | 358 |
起始页: | 799 |
结束页: | 803 |
显示于类别: | Conferences Paper |