Fabrication and characterization of gated Si field emitter arrays with gate aperture below 0.5 mu m

標題:	Fabrication and characterization of gated Si field emitter arrays with gate aperture below 0.5 mu m
作者:	Ku, TK Hsieh, BB Chen, MS Wang, CC Wang, PW Hsieh, IJ Cheng, HC 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
關鍵字:	oxidation sharpening;microtips;gated field emitter arrays;silicon pedestal;gate aperture;field emission
公開日期:	1995
URI:	http://hdl.handle.net/11536/19968 http://dx.doi.org/10.1117/12.220935
ISBN:	0-8194-2007-7
DOI:	10.1117/12.220935
期刊:	MICROELECTRONIC STRUCTURES AND MICROELECTROMECHANICAL DEVICES FOR OPTICAL PROCESSING AND MULTIMEDIA APPLICATIONS
Volume:	2641
起始頁:	140
結束頁:	144
Appears in Collections:	Conferences Paper

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