標題: Nano-crystallized titanium oxide resistive memory with uniform switching and long endurance
作者: Cheng, C. H.
Chin, Albert
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-四月-2013
摘要: We report a novel resistive random access memory using tri-layer dielectrics of GeO (x) /nano-crystal TiO2/TaON and low cost top Ni and bottom TaN electrodes. Excellent device performance of ultra-low 720 fJ switching energy, tight distributions of set/reset currents, and exceptionally long endurance of 5x10(9) cycles were achieved simultaneously. Such excellent endurance may create new applications such as those used for Data Centers that are ascribed to the higher-kappa nano-crystal TiO2, hopping pass via grain boundaries, and fast switching speed of 100 ns to improve the dielectric fatigue during endurance stress.
URI: http://dx.doi.org/10.1007/s00339-013-7547-0
http://hdl.handle.net/11536/21362
ISSN: 0947-8396
DOI: 10.1007/s00339-013-7547-0
期刊: APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume: 111
Issue: 1
起始頁: 203
結束頁: 207
顯示於類別:期刊論文


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