The effect of thermal treatment on device characteristic and reliability for sub-100-nm CMOSFETs

Abstract

The effect of post-thermal annealing after halo implantation on device characteristic and reliability of sub-100-nm CMOSFETs was investigated. We found that the control of annealing time is more efficient than that of annealing temperature with respect to improving the hot-carrier-induced degradation. The best result of device performance and reliability was obtained by a post-thermal annealing treatment performed at medium temperatures (e.g., 900 degreesC) for a longer time (>1 min).