標題: Device transfer technology by backside etching (DTBE) for poly-Si thin-film transistors on glass/plastic substrate
作者: Wang, SC
Yeh, CF
Huang, CK
Dai, YT
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: thin-film transistor;poly-Si;glass substrate;plastic substrate;CMP;wet etching
公開日期: 15-九月-2003
摘要: This work presents a novel method entitled "device transfer by backside etching (DTBE)" for transferring thin-film devices from Si wafers to a glass or plastic substrate. First, high performance poly-Si thin-film transistors (TFTs) were fabricated on a Si wafer and then adhered to glass or plastic substrates. The remaining Si was removed delicately using wafer. backside chemical-mechanical polishing (CMP) and wet chemical etching. The devices after transferring exhibit comparable electrical characteristics to the original ones on Si substrates. The new transfer scheme has quite attractive applications for fabricating high-quality displays on low-cost substrates with low melting temperatures.
URI: http://dx.doi.org/10.1143/JJAP.42.L1044
http://hdl.handle.net/11536/27529
ISSN: 0021-4922
DOI: 10.1143/JJAP.42.L1044
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
Volume: 42
Issue: 9AB
起始頁: L1044
結束頁: L1046
顯示於類別:期刊論文


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